Collect. Czech. Chem. Commun.
1981, 46, 1254-1257
https://doi.org/10.1135/cccc19811254
Carbonyl fluoride formation by cw-CO2 laser-induced and sulfur hexafluoride-sensitized decomposition of hexafluoroacetone
Josef Polaa, Pavel Engstb and Milan Horákb
a Institute of Chemical Process Fundamentals, Czechoslovak Academy of Sciences, 165 02 Prague 6-Suchdol
b The J. Heyrovský Institute of Physical Chemistry and Electrochemistry, Czechoslovak Academy of Sciences, 121 38 Prague 2
Crossref Cited-by Linking
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- Pola J., Papoušková Z., Bastl Z., Tláskal J.: Laser-induced chemistry in silane-hexafluoroacetone mixtures for production of novel Si/C/F/O and C/F/O materials. Appl. Phys. B 1993, 56, 313. <https://doi.org/10.1007/BF00325222>
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