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Collect. Czech. Chem. Commun. 1991, 56, 865-873
https://doi.org/10.1135/cccc19910865

Thermodynamic analysis of the deposition of (Ga, Al)As epitaxial layers prepared by the MOCVD technique

Jindřich Leitnera, Petr Voňkab, Jan Mikuleca, Josef Stejskalc and Přemysl Klímac

a Department of Materials for Electronics, Prague Institute of Chemical Technology, 166 28 Prague 6
b Department of Physical Chemistry, Prague Institute of Chemical Technology, 166 28 Prague 6
c A. S. Popov Research Institute of Radiocommunication, 142 21 Prague 4

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