Collect. Czech. Chem. Commun. 1992, 57, 248-254
https://doi.org/10.1135/cccc19920248

Interactions of the SiHxCly Silicon Species with the Si4H9 Cluster

Jaroslav Burdaa, Michal Burešb and Čestmír Černýb

a Institute of Macromolecular Chemistry, Czechoslovak Academy of Sciences, 162 06 Prague 6
b Department of Physical Chemistry, Prague Institute of Chemical Technology, 166 28 Prague 6

Abstract

The CNDO/2 method was applied to the investigation of the surface reaction occurring during the epitaxial growth of silicon single crystals. The aim of the work was to find silicon species from which the crystal growth is possible under the reaction conditions chosen to comply with the application of the CVD technological method. Calculations suggest that the SiH2, SiHCl and SiH3 species are feasible for the further growth.